Cultural advice

The Australian National University acknowledges, celebrates and pays our respects to the Ngunnawal and Ngambri people of the Canberra region and to all First Nations Australians on whose traditional lands we meet and work, and whose cultures are among the oldest continuing cultures in human history.

Aboriginal and Torres Strait Islander peoples are advised that ANU Library collections may include images, names, voices, and other representations of deceased persons.

Material in the collection may contain terms, language or views that reflect the period in which the item was created and may be considered inappropriate today.

Boron diffusion in amorphous silicon-germanium alloys

Simple item page
dc.contributor.authorEdelman, L A
dc.contributor.authorPhen, M S
dc.contributor.authorJones, K S
dc.contributor.authorElliman, Robert
dc.contributor.authorRubin, L
dc.date.accessioned2015-12-08T22:29:21Z
dc.date.available2015-12-08T22:29:21Z
dc.date.issued2008
dc.date.updated2015-12-08T09:21:34Z
dc.description.abstractThe effect of Ge alloying on B diffusion in amorphous Si1-x Gex alloys is reported for x=0-0.24. The diffusivity was not observed to exhibit any transient decay. The diffusivity decreases with increasing Ge concentration. The activation energy for B diffusion appears to increase from 2.8 eV for amorphous Si to 3.6 eV for amorphous Si0.76 Ge0.24. It is suggested that, in these alloys, Ge distorts the amorphous Si network thereby increasing B trapping by Si.
dc.identifier.issn0003-6951
dc.identifier.urihttp://hdl.handle.net/1885/34070
dc.publisherAmerican Institute of Physics (AIP)
dc.sourceApplied Physics Letters
dc.subjectKeywords: Activation energy; Amorphous alloys; Boron; Charge trapping; Diffusion; Boron diffusion; Transient decay; Silicon alloys
dc.titleBoron diffusion in amorphous silicon-germanium alloys
dc.typeJournal article
local.bibliographicCitation.issue172108
local.bibliographicCitation.lastpage3
local.bibliographicCitation.startpage1
local.contributor.affiliationEdelman, L A, University of Florida
local.contributor.affiliationPhen, M S, University of Florida
local.contributor.affiliationJones, K S , University of Florida
local.contributor.affiliationElliman, Robert, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationRubin, L, Axcelis Technologies
local.contributor.authoruidElliman, Robert, u9012877
local.description.notesImported from ARIES
local.identifier.absfor091207 - Metals and Alloy Materials
local.identifier.ariespublicationu3488905xPUB109
local.identifier.citationvolume92
local.identifier.doi10.1063/1.2919085
local.identifier.scopusID2-s2.0-43049139134
local.identifier.thomsonID000255524000038
local.type.statusPublished Version

Downloads

Collections

ANU Research Publications

DSpace software copyright © 2002-2026 LYRASIS