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Tellurium oxide thin film waveguides for integrated photonics

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Date

2012

Authors

Vu, Khu
Madden, Steve

Journal Title

Journal ISSN

Volume Title

Publisher

Conference Organising Committee

Abstract

We report the fabrication of Tellurium oxide films with deposited propagation losses that are sufficiently low to allow the fabrication of high quality planar integrated optical devices. Stoichiometric low loss films were produced by reactive magnetron RF sputtering and the effect of a wide range of sputtering parameters on stoichiometry, refractive index, Raman spectra and optical loss of thin films were investigated. As deposited TeO2 films with propagation losses below 0.1 dB/cm at 1550nm have been achieved which are therefore well suited for integrated optical applications.

Description

Keywords

Keywords: High quality; Integrated optical devices; Integrated photonics; Optical applications; Propagation loss; Rf-sputtering; Sputtering parameters; Tellurium oxide; Tellurium oxide films; Integrated optics; Optical glass; Oxide films; Photonics; Refractive inde

Citation

URI

http://hdl.handle.net/1885/69146

Collections

ANU Research Publications

Source

Ceramic Transactions

Type

Conference paper

Book Title

Entity type

Access Statement

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DOI

10.1002/9781118472590.ch21

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