An experimental and analytical study of an asymmetric capacitively coupled plasma used for plasma polymerization

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dc.contributor.authorMichelmore, Andrew
dc.contributor.authorWhittle, Jason D
dc.contributor.authorShort, Rob
dc.contributor.authorBoswell, Roderick
dc.contributor.authorCharles, Christine
dc.date.accessioned2015-12-13T22:32:57Z
dc.date.issued2014
dc.date.updated2015-12-11T09:12:05Z
dc.description.abstractPlasma processing is widely used to provide novel surface modifications to materials for a variety of applications. Typically, the systems used to carry out these modifications are poorly characterised. Here we describe the basics of a global model for a
dc.identifier.issn1612-8850
dc.identifier.urihttp://hdl.handle.net/1885/75804
dc.publisherWiley - V C H Verlag GmbbH & Co.
dc.sourcePlasma Processes and Polymers
dc.titleAn experimental and analytical study of an asymmetric capacitively coupled plasma used for plasma polymerization
dc.typeJournal article
local.bibliographicCitation.issue9
local.bibliographicCitation.lastpage841
local.bibliographicCitation.startpage833
local.contributor.affiliationMichelmore, Andrew, University of South Australia
local.contributor.affiliationWhittle, Jason D, University of South Australia
local.contributor.affiliationShort, Rob, University of South Australia
local.contributor.affiliationBoswell, Roderick, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationCharles, Christine, College of Physical and Mathematical Sciences, ANU
local.contributor.authoruidBoswell, Roderick, u8000743
local.contributor.authoruidCharles, Christine, u4025692
local.description.embargo2037-12-31
local.description.notesImported from ARIES
local.identifier.absfor091000 - MANUFACTURING ENGINEERING
local.identifier.ariespublicationU3488905xPUB4798
local.identifier.citationvolume11
local.identifier.doi10.1002/ppap.201400026
local.identifier.scopusID2-s2.0-84908155844
local.identifier.thomsonID000342961600003
local.type.statusPublished Version

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