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Surface passivation by atomic-layer-deposited Al 2 O 3 /TiO 2 stacks

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Date

2013

Authors

Suh, Dong Chul
Yu, Jun X
Liang, Wensheng
Weber, Klaus
Choi, Duk-Yong

Journal Title

Journal ISSN

Volume Title

Publisher

IEEE

Abstract

A detailed study of the passivation quality of Al2O3 and TiO2 stacks on boron-doped emitters, where the stacks were deposited by thermal atomic layer deposition. The passivation quality was studied for different post-TiO2 anneal temperature, as a function

Description

Keywords

Citation

URI

http://hdl.handle.net/1885/82695

Collections

ANU Research Publications

Source

Conference Record of the IEEE Photovoltaic Specialists Conference

Type

Conference paper

Book Title

Entity type

Access Statement

License Rights

DOI

10.1109/PVSC.2013.6744381

Restricted until

2037-12-31

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01_Suh_Surface_passivation_by_2013.pdf (245.06 KB)

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