Single-step RIE fabrication process of low loss InP waveguide using CH 4 /H 2 chemistry
Date
2011
Authors
Lysevych, Mykhaylo
Karouta, Fouad
Jagadish, Chennupati
Tan, Hark Hoe
Journal Title
Journal ISSN
Volume Title
Publisher
Electrochemical Society Inc
Abstract
Single-step C H4 / H2 -based reactive ion etching (RIE) process, without alternating O2 plasma treatment, has been developed with virtually no polymer buildup on the etched surface. InP ridge waveguides up to 1.9 μm high were etched without any mid- or p
Description
Keywords
Keywords: Etched surface; Fabrication process; InP; Low loss; Plasma treatment; Ridge waveguides; Root mean square roughness; Single-step; Waveguide propagation; Electric losses; Plasma applications; Waveguides; Reactive ion etching
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Source
Journal of the Electrochemical Society
Type
Journal article
Book Title
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Restricted until
2037-12-31