Single-step RIE fabrication process of low loss InP waveguide using CH 4 /H 2 chemistry
Date
Authors
Lysevych, Mykhaylo
Karouta, Fouad
Jagadish, Chennupati
Tan, Hark Hoe
Journal Title
Journal ISSN
Volume Title
Publisher
Electrochemical Society Inc
Abstract
Single-step C H4 / H2 -based reactive ion etching (RIE) process, without alternating O2 plasma treatment, has been developed with virtually no polymer buildup on the etched surface. InP ridge waveguides up to 1.9 μm high were etched without any mid- or p
Description
Citation
Collections
Source
Journal of the Electrochemical Society
Type
Book Title
Entity type
Access Statement
License Rights
Restricted until
2037-12-31