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Above-Band Gap Photoinduced Stabilization of Engineered Ferroelectric Domains

dc.contributor.authorMai, Haoxin
dc.contributor.authorLu, Teng
dc.contributor.authorLi, Qian
dc.contributor.authorLiu, Zhifu
dc.contributor.authorLi, Yongxiang
dc.contributor.authorKremer, Felipe
dc.contributor.authorLi, Li
dc.contributor.authorWithers, Ray L
dc.contributor.authorWen, Haidan
dc.contributor.authorLiu, Yun
dc.date.accessioned2020-03-19T04:14:46Z
dc.date.available2020-03-19T04:14:46Z
dc.date.issued2018-04-18
dc.description.abstractThe effect of above-band gap photons on the domains of the BiFeO3 (BFO) thin film was investigated via piezoresponse force microscopy and Kelvin probe force microscopy. It is found that under above-band gap illumination, the relaxation time of the polarization state was significantly extended, while the effective polarizing voltage for the pristine domains was reduced. We propose that this photoinduced domain stabilization can be attributed to the interaction between photogenerated surface charges and domains. Importantly, a similar phenomenon is observed in other ferroelectric (FE) materials with an internal electric field once they are illuminated by above-band gap light, indicating that this photoinduced stabilization is potentially universal rather than specific to BFO. Thus, this study will not only contribute to the knowledge of photovoltaic (PV) phenomena but also provide a new route to promote the stability of PV and FE materials.en_AU
dc.format.mimetypeapplication/pdfen_AU
dc.identifier.issn1944-8244en_AU
dc.identifier.urihttp://hdl.handle.net/1885/202382
dc.language.isoen_AUen_AU
dc.provenancehttp://sherpa.ac.uk/romeo/issn/1944-8244/..."author can archive post-print (ie final draft post-refereeing). 12 months embargo" from SHERPA/RoMEO site (as at 19/03/2020). This document is the Accepted Manuscript version of a Published Work that appeared in final form in ACS applied materials & interfaces, copyright © American Chemical Society after peer review and technical editing by the publisher. To access the final edited and published work see https://dx.doi.org/10.1021/acsami.8b00254 or http://pubs.acs.org/page/policy/articlesonrequest/index.htmlen_AU
dc.publisherAmerican Chemical Societyen_AU
dc.relationhttp://purl.org/au-research/grants/arc/DP160104780en_AU
dc.rights© 2018 American Chemical Societyen_AU
dc.sourceACS applied materials & interfacesen_AU
dc.subjectkpfmen_AU
dc.subjectpfmen_AU
dc.subjectabove-band gap illuminationen_AU
dc.subjectdomainen_AU
dc.subjectferroelectricsen_AU
dc.subjectrelaxation timeen_AU
dc.subjectsurfaceen_AU
dc.titleAbove-Band Gap Photoinduced Stabilization of Engineered Ferroelectric Domainsen_AU
dc.typeJournal articleen_AU
dcterms.accessRightsOpen Accessen_AU
local.bibliographicCitation.issue15en_AU
local.bibliographicCitation.lastpage12789en_AU
local.bibliographicCitation.startpage12781en_AU
local.contributor.affiliationMai, Haoxin, Research School of Chemistry, The Australian National Universityen_AU
local.contributor.affiliationLu, Teng, Research School of Chemistry, The Australian National Universityen_AU
local.contributor.affiliationWithers, Ray L., Research School of Chemistry, The Australian National Universityen_AU
local.contributor.affiliationLiu, Yun, Research School of Chemistry, The Australian National Universityen_AU
local.contributor.authoruidu4036265en_AU
local.identifier.ariespublicationa383154xPUB9766
local.identifier.citationvolume10en_AU
local.identifier.doi10.1021/acsami.8b00254en_AU
local.identifier.essn1944-8252en_AU
local.publisher.urlhttps://pubs.acs.org/en_AU
local.type.statusAccepted Versionen_AU

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