Above-Band Gap Photoinduced Stabilization of Engineered Ferroelectric Domains
Date
2018-04-18
Authors
Mai, Haoxin
Lu, Teng
Li, Qian
Liu, Zhifu
Li, Yongxiang
Kremer, Felipe
Li, Li
Withers, Ray L
Wen, Haidan
Liu, Yun
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American Chemical Society
Abstract
The effect of above-band gap photons on the domains of the BiFeO3 (BFO) thin film was investigated via piezoresponse force microscopy and Kelvin probe force microscopy. It is found that under above-band gap illumination, the relaxation time of the polarization state was significantly extended, while the effective polarizing voltage for the pristine domains was reduced. We propose that this photoinduced domain stabilization can be attributed to the interaction between photogenerated surface charges and domains. Importantly, a similar phenomenon is observed in other ferroelectric (FE) materials with an internal electric field once they are illuminated by above-band gap light, indicating that this photoinduced stabilization is potentially universal rather than specific to BFO. Thus, this study will not only contribute to the knowledge of photovoltaic (PV) phenomena but also provide a new route to promote the stability of PV and FE materials.
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Keywords
kpfm, pfm, above-band gap illumination, domain, ferroelectrics, relaxation time, surface
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ACS applied materials & interfaces
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Journal article
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Open Access
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