In-situ Microscopy Study of Nanocavity Shrinkage in Si under Ion Beam Irradiation

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dc.contributor.authorRuault, M-O
dc.contributor.authorRidgway, Mark C
dc.contributor.authorFortuna, Frank Nicholas
dc.contributor.authorBernas, Harry
dc.contributor.authorWilliams, James
dc.date.accessioned2015-12-13T23:09:14Z
dc.date.available2015-12-13T23:09:14Z
dc.date.issued2003
dc.date.updated2015-12-12T08:18:15Z
dc.description.abstractWe report an in situ transmission electron microscopy (TEM) study of nanocavity evolution in amorphous Si (a-Si) under ion beam irradiation. The size evolution of the nanocavities was monitored during ion irradiation with Si or As at various temperatures
dc.identifier.issn1286-0042
dc.identifier.urihttp://hdl.handle.net/1885/86903
dc.publisherEDP Sciences
dc.sourceEuropean Physical Journal - Applied Physics
dc.subjectKeywords: Crystalline materials; Irradiation; Shrinkage; Temperature; Transmission electron microscopy; Ion beam irradiation; Ion radiation effects; Irradiation-induced atomic displacement rate; Irradiation-induced nanocavity shrinkage; Amorphous silicon
dc.titleIn-situ Microscopy Study of Nanocavity Shrinkage in Si under Ion Beam Irradiation
dc.typeJournal article
local.bibliographicCitation.lastpage40
local.bibliographicCitation.startpage39
local.contributor.affiliationRuault, M-O, Universite Paris
local.contributor.affiliationRidgway, Mark C, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationFortuna, Frank Nicholas, Universite d'Evry
local.contributor.affiliationBernas, Harry, CNRS
local.contributor.affiliationWilliams, James, College of Physical and Mathematical Sciences, ANU
local.contributor.authoruidRidgway, Mark C, u9001886
local.contributor.authoruidWilliams, James, u8809701
local.description.notesImported from ARIES
local.description.refereedYes
local.identifier.absfor090699 - Electrical and Electronic Engineering not elsewhere classified
local.identifier.ariespublicationMigratedxPub15959
local.identifier.citationvolume23
local.identifier.scopusID2-s2.0-0038115168
local.type.statusPublished Version

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