Selective area epitaxy of III-V nanostructure arrays and networks: Growth, applications, and future directions
Date
2021-04-02
Authors
yuan, xiaoming
Pan, Dong
Zhou, Yijin
Zhang, Xutao
Peng, Kun
Zhao, Bijun
Deng, Mingtang
He, Jun
Tan, Hark Hoe
Jagadish, Chennupati
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AIP Publishing LLC
Abstract
Selective area epitaxy (SAE) can be used to grow highly uniform III-V nanostructure arrays in a fully controllable way and is thus of great interest in both basic science and device applications. Here, an overview of this promising technique is presented, focusing on the growth fundamentals, formation of III-V nanowire arrays, monolithic integration of III-V nanowire arrays on silicon, the growth of nanowire heterostructures, and networks of various shapes. The applications of these III-V nanostructure arrays in photonics, electronics, optoelectronics, and quantum science are also reviewed. Finally, the current challenges and opportunities provided by SAE are discussed.
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Applied Physics Reviews
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Journal article
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Open Access
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