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Process control of reactive sputter deposition of AlO x and improved surface passivation of crystalline silicon

Date

Authors

Zhang, Xinyu

Cuevas, Andres

Thomson, Andrew

Publisher

IEEE Electron Devices Society

Abstract

In this paper, we investigate the relationship between the deposition-process parameters of reactively sputtered aluminium oxide films and the passivation of silicon surfaces. A method of tuning the deposition process has been established that results in

Keywords

Keywords: Aluminium oxide; Crystalline silicons; Deposition pressures; Deposition process; Effective lifetime; Film characterizations; Low Power; Reactive sputter deposition; Silicon surfaces; Spectroscopy measurements; Sputtering target; Surface passivation; Surfa Photovoltaic cells; process control; silicon; sputtering; surfaces

URI

http://hdl.handle.net/1885/69866

Collections

ANU Research Publications

Source

IEEE Journal of Photovoltaics

Type

Journal article

DOI

10.1109/JPHOTOV.2012.2214765

Restricted until

2037-12-31

Downloads

File

Description

01_Zhang_Process_control_of_reactive_2013.pdf (814.04 KB)