Saturation of Photoluminescence Intensity from Si Nanocrystals Exposed to Atomic Hydrogen
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Authors
Cho, Hyun-Ji
Yoon, Jong-Hwan
Elliman, Robert
Wilkinson, Andrew
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Volume Title
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Hanguk Mulli Hakhoe
Abstract
Si nanocrystals embedded in silicon dioxide films are exposed to an atomic hydrogen plasma at different temperatures in the range from 100 °C to 350 °C. The photoluminescence (PL) from the nanocrystals is shown to increase in intensity with increasing e
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Journal of the Korean Physical Society