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Plasma Synthesis of Catalytic Thin Films

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Date

2002

Authors

Thomann, A
Rozenbaum, J
Brault, Pascal
Andreazza, C
Andreazza, P
Rousseau, M
Estrade-Szwarckopf, H
Berthet, A
Bertolini, J
Cadete Santos Aires, F

Journal Title

Journal ISSN

Volume Title

Publisher

International Union of Pure and Applied Chemistry

Abstract

Plasma sputter deposition is introduced in the field of catalyst preparation. It is shown that growth kinetics and morphologies are determined by ion to neutral flux ratio and kinetic energies of sputtered atoms. Catalytic activity of such catalysts compares very well with classical catalysts.

Description

Keywords

Keywords: catalysis; chemical reaction kinetics; conference paper; film; physical chemistry; plasma chemistry; priority journal; synthesis

Citation

URI

http://hdl.handle.net/1885/89695

Collections

ANU Research Publications

Source

Pure and Applied Chemistry

Type

Journal article

Book Title

Entity type

Access Statement

License Rights

DOI

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