Plasma Synthesis of Catalytic Thin Films
Date
Authors
Thomann, A
Rozenbaum, J
Brault, Pascal
Andreazza, C
Andreazza, P
Rousseau, M
Estrade-Szwarckopf, H
Berthet, A
Bertolini, J
Cadete Santos Aires, F
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Volume Title
Publisher
International Union of Pure and Applied Chemistry
Abstract
Plasma sputter deposition is introduced in the field of catalyst preparation. It is shown that growth kinetics and morphologies are determined by ion to neutral flux ratio and kinetic energies of sputtered atoms. Catalytic activity of such catalysts compares very well with classical catalysts.
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Pure and Applied Chemistry