Plasma Synthesis of Catalytic Thin Films
Date
2002
Authors
Thomann, A
Rozenbaum, J
Brault, Pascal
Andreazza, C
Andreazza, P
Rousseau, M
Estrade-Szwarckopf, H
Berthet, A
Bertolini, J
Cadete Santos Aires, F
Journal Title
Journal ISSN
Volume Title
Publisher
International Union of Pure and Applied Chemistry
Abstract
Plasma sputter deposition is introduced in the field of catalyst preparation. It is shown that growth kinetics and morphologies are determined by ion to neutral flux ratio and kinetic energies of sputtered atoms. Catalytic activity of such catalysts compares very well with classical catalysts.
Description
Keywords
Keywords: catalysis; chemical reaction kinetics; conference paper; film; physical chemistry; plasma chemistry; priority journal; synthesis
Citation
Collections
Source
Pure and Applied Chemistry
Type
Journal article