Plasma Synthesis of Catalytic Thin Films

dc.contributor.authorThomann, A
dc.contributor.authorRozenbaum, J
dc.contributor.authorBrault, Pascal
dc.contributor.authorAndreazza, C
dc.contributor.authorAndreazza, P
dc.contributor.authorRousseau, M
dc.contributor.authorEstrade-Szwarckopf, H
dc.contributor.authorBerthet, A
dc.contributor.authorBertolini, J
dc.contributor.authorCadete Santos Aires, F
dc.contributor.authorMonnet, F
dc.contributor.authorMirodatos, C
dc.contributor.authorCharles, Christine
dc.contributor.authorBoswell, Roderick
dc.date.accessioned2015-12-13T23:17:23Z
dc.date.available2015-12-13T23:17:23Z
dc.date.issued2002
dc.date.updated2015-12-12T08:52:44Z
dc.description.abstractPlasma sputter deposition is introduced in the field of catalyst preparation. It is shown that growth kinetics and morphologies are determined by ion to neutral flux ratio and kinetic energies of sputtered atoms. Catalytic activity of such catalysts compares very well with classical catalysts.
dc.identifier.issn0033-4545
dc.identifier.urihttp://hdl.handle.net/1885/89695
dc.publisherInternational Union of Pure and Applied Chemistry
dc.sourcePure and Applied Chemistry
dc.subjectKeywords: catalysis; chemical reaction kinetics; conference paper; film; physical chemistry; plasma chemistry; priority journal; synthesis
dc.titlePlasma Synthesis of Catalytic Thin Films
dc.typeJournal article
local.bibliographicCitation.issue3
local.bibliographicCitation.lastpage474
local.bibliographicCitation.startpage471
local.contributor.affiliationThomann, A, CNRS Univesite d'Orleans
local.contributor.affiliationRozenbaum, J, CNRS
local.contributor.affiliationBrault, Pascal, Universite d'Orleans
local.contributor.affiliationAndreazza, C, CNRS
local.contributor.affiliationAndreazza, P, CNRS
local.contributor.affiliationRousseau, M, Institut Pluridisciplinaire Hubert Curien
local.contributor.affiliationEstrade-Szwarckopf, H, CNRS
local.contributor.affiliationBerthet, A, CNRS
local.contributor.affiliationBertolini, J, CNRS
local.contributor.affiliationCadete Santos Aires, F, CNRS
local.contributor.affiliationMonnet, F, CNRS
local.contributor.affiliationMirodatos, C, CNRS
local.contributor.affiliationCharles, Christine, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationBoswell, Roderick, College of Physical and Mathematical Sciences, ANU
local.contributor.authoremailu4025692@anu.edu.au
local.contributor.authoruidCharles, Christine, u4025692
local.contributor.authoruidBoswell, Roderick, u8000743
local.description.notesImported from ARIES
local.description.refereedYes
local.identifier.absfor020204 - Plasma Physics; Fusion Plasmas; Electrical Discharges
local.identifier.ariespublicationMigratedxPub19801
local.identifier.citationvolume74
local.identifier.scopusID2-s2.0-0036296008
local.identifier.uidSubmittedByMigrated
local.type.statusPublished Version

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