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Influence of growth temperature and V/III ratio on Au-assisted In x Ga 1-x As nanowires

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Ameruddin, Amira
Fonseka, Aruni
Gao, Qiang
Wong-Leung, Jennifer
Parkinson, Patrick
Breuer, Steffan
Jagadish, Chennupati
Tan, Hark Hoe

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Institute of Electrical and Electronics Engineers (IEEE Inc)

Abstract

InxGa1-xAs nanowires were grown using metal-organic chemical vapour deposition (MOCVD) with various growth temperatures and V/III ratios. The morphology of these nanowires and the composition distribution along the nanowire were studied as a function of these growth parameters. With higher growth temperature and lower V/III ratio, the tapering of the nanowires is reduced. However, the incorporation of Ga in the nanowires is also reduced with lower V/III ratio. The composition distribution along the nanowires is non-uniform with typically In-rich bases and Ga-rich tips.

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COMMAD 2012 Proceedings

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Restricted until

2037-12-31