Impurity-free disordering mechanisms in GaAs-based structures using doped spin-on silica layers
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Deenapanray, Prakash N. K
Gong, Bin
Lamb, R. N
Martin, A
Fu, Lan
Jagadish, C.
Tan, Hark Hoe
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American Institute of Physics (AIP)
Abstract
We have used photoluminescence,deep level transient spectroscopy and x-ray photoelectron spectroscopy to investigate the mechanisms of impurity-free disordering in GaAs-based structures using doped spin-on silica layers. We demonstrate that VGa is efficiently converted into arsenic-antisite, AsGa, related defects (EL2-type defects) when the GaAs layer is under compressive stress. We propose that the efficient formation of EL2-type defects reduces the efficiency of impurity-free interdiffusion of GaAs/AlGaAs quantum wells.
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Applied Physics Letters