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Elasto-plastic characterisation of low-temperature plasma-deposited silicon nitride thin films using nanoindentation

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dc.contributor.authorMariusz, Martyniuk
dc.contributor.authorMusca, Charles Anthony
dc.contributor.authorDell, John Marcel
dc.contributor.authorElliman, Robert
dc.contributor.authorFaraone, Lorenzo
dc.date.accessioned2015-12-10T22:28:34Z
dc.date.issued2009
dc.date.updated2016-02-24T10:56:01Z
dc.description.abstractNanoindentation has been utilised in order to investigate the mechanical properties of low-temperature (50-300°C) plasma-deposited SiNx thin films for applications of micro-electro-mechanical systems on temperature sensitive, non-standard substrates. It
dc.identifier.issn1749-785X
dc.identifier.urihttp://hdl.handle.net/1885/54523
dc.publisherInderscience Publishers
dc.sourceInternational Journal of Surface Science and Engineering
dc.subjectKeywords: Atomic compositions; Characterisation; Deposition process; Deposition temperatures; Elasto plastics; Higher temperatures; Low temperatures; Low-temperature plasmas; Micro-electro-mechanical systems; Significant surfaces; Silicon nitride thin films; Temper Elasto-plasticity; Hardness; MEMS; Micro-electro-mechanical systems; Nanoindentation; Silicon nitride; Thin films; Young's modulus
dc.titleElasto-plastic characterisation of low-temperature plasma-deposited silicon nitride thin films using nanoindentation
dc.typeJournal article
local.bibliographicCitation.issue1/2
local.bibliographicCitation.lastpage22
local.bibliographicCitation.startpage3
local.contributor.affiliationMariusz, Martyniuk, University of Western Australia
local.contributor.affiliationMusca, Charles Anthony, University of Western Australia
local.contributor.affiliationDell, John Marcel, University of Western Australia
local.contributor.affiliationElliman, Robert, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationFaraone, Lorenzo, University of Western Australia
local.contributor.authoruidElliman, Robert, u9012877
local.description.embargo2037-12-31
local.description.notesImported from ARIES
local.identifier.absfor020204 - Plasma Physics; Fusion Plasmas; Electrical Discharges
local.identifier.ariespublicationu4326120xPUB303
local.identifier.citationvolume3
local.identifier.doi10.1504/IJSURFSE.2009.024359
local.identifier.scopusID2-s2.0-64249155231
local.type.statusPublished Version

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