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Elasto-plastic characterisation of low-temperature plasma-deposited silicon nitride thin films using nanoindentation

Date

Authors

Mariusz, Martyniuk

Musca, Charles Anthony

Dell, John Marcel

Elliman, Robert

Faraone, Lorenzo

Publisher

Inderscience Publishers

Abstract

Nanoindentation has been utilised in order to investigate the mechanical properties of low-temperature (50-300°C) plasma-deposited SiNx thin films for applications of micro-electro-mechanical systems on temperature sensitive, non-standard substrates. It

Keywords

Keywords: Atomic compositions; Characterisation; Deposition process; Deposition temperatures; Elasto plastics; Higher temperatures; Low temperatures; Low-temperature plasmas; Micro-electro-mechanical systems; Significant surfaces; Silicon nitride thin films; Temper Elasto-plasticity; Hardness; MEMS; Micro-electro-mechanical systems; Nanoindentation; Silicon nitride; Thin films; Young's modulus

URI

http://hdl.handle.net/1885/54523

Collections

ANU Research Publications

Source

International Journal of Surface Science and Engineering

Type

Journal article

DOI

10.1504/IJSURFSE.2009.024359

Restricted until

2037-12-31

Downloads

File

Description

01_Mariusz_Elasto-plastic_2009.pdf (39.96 KB)

02_Mariusz_Elasto-plastic_2009.pdf (588.66 KB)