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Submicrometer-Thick Low-Loss As 2 S 3 Planar Waveguides for Nonlinear Optical Devices

Date

Authors

Madden, Steve

Bulla, Douglas

Wang, Rongping

Rode, Andrei V

Luther-Davies, Barry

Choi, Duk-Yong

Publisher

Institute of Electrical and Electronics Engineers (IEEE Inc)

Abstract

We describe a fabrication process for and the characterization of submicrometer-thick As2S3 waveguides. Poly(methylmethacrylate) and bottom antireflective coating were employed as thin protective layers prior to photoresist patterning in order to prevent

Keywords

Keywords: Alkaline developer; Bottom antireflective coating; Etched sidewalls; Fabrication process; Low loss; Nonlinear optical devices; Photoresist patterning; Propagation loss; Protective layers; Submicrometers; Surface scattering; Transverse-magnetic mode; Amorp Amorphous semiconductors; Fabrication; Nonlinear optic devices; Optical waveguides

URI

http://hdl.handle.net/1885/56747

Collections

ANU Research Publications

Source

IEEE Photonics Technology Letters

Type

Journal article

DOI

10.1109/LPT.2010.2040170

Restricted until

2037-12-31

Downloads

File

Description

01_Choi_Submicrometer-Thick_Low-Loss_2010.pdf (406.38 KB)