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Rutherford backscattering using electrons as projectiles: Underlying principles and possible applications

dc.contributor.authorWent, Michael
dc.contributor.authorVos, Maarten
dc.date.accessioned2015-12-10T21:57:42Z
dc.date.issued2008
dc.date.updated2015-12-09T07:47:50Z
dc.description.abstractIon beam analysis is the method of choice for studying the composition of layers with a thickness exceeding several tens of Å. Recently it has become clear that elastic scattering of keV electrons can be used to determine the surface composition of relat
dc.identifier.issn0168-583X
dc.identifier.urihttp://hdl.handle.net/1885/39897
dc.publisherElsevier
dc.sourceNuclear Instruments and Methods in Physics Research: Section B
dc.subjectKeywords: Elastic scattering; Electron scattering; Electron spectroscopy; Ion beams; Surface analysis; Surface structure; Ion beam analysis; Ion scattering; Thick layers; Rutherford backscattering spectroscopy Electron-scattering; Rutherford backscattering; Surface analysis
dc.titleRutherford backscattering using electrons as projectiles: Underlying principles and possible applications
dc.typeJournal article
local.bibliographicCitation.lastpage101
local.bibliographicCitation.startpage998
local.contributor.affiliationWent, Michael, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationVos, Maarten, College of Physical and Mathematical Sciences, ANU
local.contributor.authoruidWent, Michael, u3210150
local.contributor.authoruidVos, Maarten, u9700295
local.description.embargo2037-12-31
local.description.notesImported from ARIES
local.identifier.absfor020401 - Condensed Matter Characterisation Technique Development
local.identifier.ariespublicationu4169254xPUB185
local.identifier.citationvolume266
local.identifier.doi10.1016/j.nimb.2008.01.059
local.identifier.scopusID2-s2.0-41549089162
local.identifier.thomsonID000255701800024
local.type.statusPublished Version

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