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Nonlinear Optical Absorption and Temporal Response of Arsenic-and Oxygen-Implantated GaAs

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dc.contributor.authorLederer, Maximilianen_AU
dc.contributor.authorLuther-Davies, Barryen_AU
dc.contributor.authorJagadish, Chennupatien_AU
dc.contributor.authorHaiml, Men_AU
dc.contributor.authorSiegner, Uen_AU
dc.contributor.authorKeller, Uen_AU
dc.contributor.authorTan, Hark Hoeen_AU
dc.date.accessioned2015-12-13T23:34:21Z
dc.date.issued1999
dc.date.updated2015-12-12T09:35:43Z
dc.description.abstractThe nonlinear optical absorption of arsenic and oxygen implanted epitaxial GaAs for a range of ion doses and annealing temperatures were examined. Results showed that ion implantation decreases response time (τA) and parameter (Mmax), with the decrease i
dc.identifier.issn0003-6951
dc.identifier.urihttp://hdl.handle.net/1885/93421
dc.publisherAmerican Institute of Physics (AIP)
dc.sourceApplied Physics Letters
dc.subjectKeywords: Amorphization; Annealing; Ion implantation; Light absorption; Light modulation; Nonlinear optics; Nonlinear optical absorption; Semiconducting gallium arsenide
dc.titleNonlinear Optical Absorption and Temporal Response of Arsenic-and Oxygen-Implantated GaAs
dc.typeJournal article
local.bibliographicCitation.issue14
local.bibliographicCitation.lastpage1995
local.bibliographicCitation.startpage1993
local.contributor.affiliationLederer, Maximilian, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationLuther-Davies, Barry, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationTan, Hoe Hark, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationJagadish, Chennupati, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationHaiml, M, Swiss Federal Institute of Technology, ETH
local.contributor.affiliationSiegner, U, Swiss Federal Institute of Technology, ETH
local.contributor.affiliationKeller, U, Swiss Federal Institute of Technology, ETH
local.contributor.authoruidLederer, Maximilian, u9510571
local.contributor.authoruidLuther-Davies, Barry, u7601418
local.contributor.authoruidTan, Hoe Hark, u9302338
local.contributor.authoruidJagadish, Chennupati, u9212349
local.description.embargo2037-12-31
local.description.notesImported from ARIES
local.description.refereedYes
local.identifier.absfor020204 - Plasma Physics; Fusion Plasmas; Electrical Discharges
local.identifier.ariespublicationMigratedxPub24765
local.identifier.citationvolume74
local.identifier.scopusID2-s2.0-0032621369
local.type.statusPublished Version

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