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Low loss, plasma beam assisted reactive magnetron sputtered silicon nitride films for optical applications

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Date

2019

Authors

Frigg, Andreas
Boes, Andreas
Ren, Guanghui
Choi, Duk-Yong
Gees, Silvio
Mitchell, Arnan

Journal Title

Journal ISSN

Volume Title

Publisher

Optical Society of American (OSA)

Abstract

CMOS-compatible SiN layers with ultra-low roughness were deposited using plasma beam assisted reactive sputtering. Material losses below 0.1 dB/cm making it a promising deposition method for photonic integrated circuits and multilayer coatings.

Description

Keywords

Citation

URI

http://hdl.handle.net/1885/300291

Collections

ANU Research Publications

Source

Optics InfoBase Conference Papers Volume Part F162-OIC 2019, 2019

Type

Conference paper

Book Title

Entity type

Access Statement

License Rights

DOI

10.1364/OIC.2019.WB.4

Restricted until

2099-12-31

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Low loss_plasma beam assisted reactive magnetron.pdf (494.11 KB)

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