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Ultrathin (<10nm) Nb 2O 5/NbO 2 hybrid memory with both memory and selector characteristics for high density 3D vertically stackable RRAM applications

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Authors

Kim, Seonghyun
Liu, Xinjun
Park, Jubong
Jung, Seungjae
Lee, Wootae
Woo, Jiyong
Shin, Jungho
Choi, Godeuni
Cho, Chumhum
Park, Sangsu

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IEEE

Abstract

We report, for the first time, the novel concept of ultrathin (∼10nm) W/NbO x/Pt device with both threshold switching (TS) and memory switching (MS) characteristics. Excellent TS characteristics of NbO 2, such as high temperature stability (∼160°C),

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Digest of Technical Papers - Symposium on VLSI Technology

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2037-12-31
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