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Characterization of oxygen self-diffusion in TiO2 resistive-switching layers by nuclear reaction profiling

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dc.contributor.authorSulzbach, M. C.
dc.contributor.authorSelau, F. F.
dc.contributor.authorTrombini, Henrique
dc.contributor.authorGrande, P. L.
dc.contributor.authorMarmitt, G. G.
dc.contributor.authorPereira, L. G.
dc.contributor.authorVos, Maarten
dc.contributor.authorElliman, Robert
dc.date.accessioned2020-06-22T01:17:48Z
dc.date.issued2019-02-15
dc.date.updated2020-01-19T07:29:05Z
dc.description.abstractOxygen self-diffusion was investigated in TiO2 layers employed for resistive-switching memories using resonant nuclear reaction profiling (NRP) and 18O labeling. The layers were grown using physical vapor deposition technique (sputtering) and were polycrystalline. The diffusivity was measured over the temperature range 600–800 °C and the activation energy for oxygen self-diffusion in sputter-deposited TiO2 films determined to be 1.09 ± 0.16 eV, a value consistent with results obtained by previous studies (Marmitt et al., 2017).en_AU
dc.description.sponsorshipThis study was financed in part by the Coordena de Aperfei oamento de Pessoal de Nvel Superior – Brasil (CAPES) – Finance Code 001, by CNPq and PRONEX-FAPERGS. We acknowledge support from the NCRIS ANFF and Heavy-Ion Accelerator Capabilities, with particular thanks to Dr. Fouad Karouta for the deposition of the (Si3N4) at ANU. RGE and MV further acknowledge the ARC funding program for financial support.en_AU
dc.format.extent4 pagesen_AU
dc.format.mimetypeapplication/pdfen_AU
dc.identifier.issn0168-583Xen_AU
dc.identifier.urihttp://hdl.handle.net/1885/205404
dc.language.isoen_AUen_AU
dc.provenancehttp://sherpa.ac.uk/romeo/issn/0168-583X/ Author can archive post-print (ie final draft post-refereeing). Author's post-print on open access repository after an embargo period of 24 months (Sherpa/Romeo 22/6/2020)
dc.publisherElsevieren_AU
dc.rights© 2019 Elsevier B.V. . Elsevier requires authors posting their accepted manuscript to attach a non-commercial Creative Commons user license (CC-BY-NC-ND). Licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International http://creativecommons.org/licenses/by-nc-nd/4.0/ https://www.elsevier.com/about/policies/sharing (Publisher journal website as of 22/6/2020)en_AU
dc.sourceNuclear Instruments and Methods in Physics Research: Section B: Beam Interactions with Materials and Atomsen_AU
dc.subjectResistive memories, Diffusion mechanisms, Nuclear Reaction Analysis, Conducting filamentsen_AU
dc.titleCharacterization of oxygen self-diffusion in TiO2 resistive-switching layers by nuclear reaction profilingen_AU
dc.typeJournal articleen_AU
dcterms.accessRightsOpen Access
dcterms.dateAccepted2018-11-14
local.bibliographicCitation.lastpage11en_AU
local.bibliographicCitation.startpage8en_AU
local.contributor.affiliationSulzbach, M.C., Federal University of Rio Grande do Sulen_AU
local.contributor.affiliationSelau, F.F., Federal University of Rio Grande do Sulen_AU
local.contributor.affiliationTrombini, Henrique, Federal University of Rio Grande do Sulen_AU
local.contributor.affiliationGrande, P L , Instituto de Fisica da Universidade Federal do Rio Grande do Sulen_AU
local.contributor.affiliationMarmitt, G.G., Instituto de Fisica da Universidade Federal do Rio Grande do Sulen_AU
local.contributor.affiliationPereira, L.G., Federal University of Rio Grande do Sulen_AU
local.contributor.affiliationVos, Maarten, College of Science, The Australian National Universityen_AU
local.contributor.affiliationElliman, Robert, College of Science, The Australian National Universityen_AU
local.contributor.authoruidVos, Maarten, u9700295en_AU
local.contributor.authoruidElliman, Robert, u9012877en_AU
local.description.notesImported from ARIES. Email reply ANU author Maarten Vos advised no ARC funding at time of project (22/6/2020)en_AU
local.identifier.absfor100712 - Nanoscale Characterisationen_AU
local.identifier.absfor020404 - Electronic and Magnetic Properties of Condensed Matter; Superconductivityen_AU
local.identifier.absfor020406 - Surfaces and Structural Properties of Condensed Matteren_AU
local.identifier.absseo970110 - Expanding Knowledge in Technologyen_AU
local.identifier.absseo970109 - Expanding Knowledge in Engineeringen_AU
local.identifier.absseo970102 - Expanding Knowledge in the Physical Sciencesen_AU
local.identifier.ariespublicationu3102795xPUB571en_AU
local.identifier.citationvolume441en_AU
local.identifier.doi10.1016/j.nimb.2018.11.026en_AU
local.identifier.scopusID2-s2.0-85059312652
local.publisher.urlhttps://www.elsevier.com/en-auen_AU
local.type.statusAccepted Versionen_AU

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