Nanostencil Lithography for fabrication of III-V nanostructures
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Vora, Kaushal
Karouta, Fouad
Jagadish, Chennupati
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SPIE - The International Society for Optical Engineering
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Nanostencil Lithography (NStL), while comparatively still in infant stages, is proving to be a viable option for low-cost and high resolution fabrication. An ideal stencil for NStL consists of a low-stressed silicon nitride membrane supported on a silicon
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Proceedings of SPIE - The International Society for Optical Engineering
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