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The Effect of Au and O Implantation on the Etch Rate of CVD Diamond

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dc.contributor.authorLeech, P W
dc.contributor.authorReeves, G K
dc.contributor.authorHolland, A S
dc.contributor.authorRidgway, Mark C
dc.date.accessioned2015-12-13T23:07:34Z
dc.date.issued2004
dc.date.updated2015-12-12T08:09:49Z
dc.description.abstractDiamond films were implanted with Au or O ions at multiple energies in order to produce a uniform region of C vacancies. Analysis of the implanted films by Raman spectroscopy has shown that the proportion of non-diamond or amorphous carbon increased with
dc.identifier.issn0169-4332
dc.identifier.urihttp://hdl.handle.net/1885/86269
dc.publisherElsevier
dc.sourceApplied Surface Science
dc.subjectKeywords: Amorphization; Chemical vapor deposition; Epitaxial growth; Etching; Gold; Ion implantation; Raman spectroscopy; Surface roughness; Bias energy; Post-implanted surfaces; Diamond films Diamond films; Etching; Ion implantation; Raman spectroscopy
dc.titleThe Effect of Au and O Implantation on the Etch Rate of CVD Diamond
dc.typeJournal article
local.bibliographicCitation.lastpage307
local.bibliographicCitation.startpage302
local.contributor.affiliationLeech, P W, CSIRO
local.contributor.affiliationReeves, G K, RMIT University
local.contributor.affiliationHolland, A S, RMIT University
local.contributor.affiliationRidgway, Mark C, College of Physical and Mathematical Sciences, ANU
local.contributor.authoruidRidgway, Mark C, u9001886
local.description.embargo2037-12-31
local.description.notesImported from ARIES
local.description.refereedYes
local.identifier.absfor020406 - Surfaces and Structural Properties of Condensed Matter
local.identifier.ariespublicationMigratedxPub15090
local.identifier.citationvolume221
local.identifier.doi10.1016/S0169-4332(03)00949-8
local.identifier.scopusID2-s2.0-0345603148
local.type.statusPublished Version

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