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The Effect of Au and O Implantation on the Etch Rate of CVD Diamond

Date

Authors

Leech, P W

Reeves, G K

Holland, A S

Ridgway, Mark C

Publisher

Elsevier

Abstract

Diamond films were implanted with Au or O ions at multiple energies in order to produce a uniform region of C vacancies. Analysis of the implanted films by Raman spectroscopy has shown that the proportion of non-diamond or amorphous carbon increased with

Keywords

Keywords: Amorphization; Chemical vapor deposition; Epitaxial growth; Etching; Gold; Ion implantation; Raman spectroscopy; Surface roughness; Bias energy; Post-implanted surfaces; Diamond films Diamond films; Etching; Ion implantation; Raman spectroscopy

URI

http://hdl.handle.net/1885/86269

Collections

ANU Research Publications

Source

Applied Surface Science

Type

Journal article

DOI

10.1016/S0169-4332(03)00949-8

Restricted until

2037-12-31

Downloads

File

Description

01_Leech_The_Effect_of_Au_and_O_2004.pdf (110.83 KB)