Cultural advice

The Australian National University acknowledges, celebrates and pays our respects to the Ngunnawal and Ngambri people of the Canberra region and to all First Nations Australians on whose traditional lands we meet and work, and whose cultures are among the oldest continuing cultures in human history.

Aboriginal and Torres Strait Islander peoples are advised that ANU Library collections may include images, names, voices, and other representations of deceased persons.

Material in the collection may contain terms, language or views that reflect the period in which the item was created and may be considered inappropriate today.

Nitrogen-induced enhancement of the free electron concentration in Sulfur implanted GaNxAs1-x

dc.contributor.authorYu, Kin Man
dc.contributor.authorWalukiewicz, W
dc.contributor.authorShan, Wei
dc.contributor.authorWu, J
dc.contributor.authorAger, J W
dc.contributor.authorHaller, E E
dc.contributor.authorGarza, J
dc.contributor.authorRidgway, Mark C
dc.date.accessioned2015-12-13T23:18:09Z
dc.date.issued2000
dc.date.updated2015-12-12T08:55:39Z
dc.description.abstractWe have achieved a large increase of the activation efficiency of sulfur atoms implanted into GaNxAs1-x thin films. For thin films with only 0.8% N content, we find a maximum free electron concentration of >6×1018cm-3 for implanted S concentration higher
dc.identifier.issn0003-6951
dc.identifier.urihttp://hdl.handle.net/1885/90035
dc.publisherAmerican Institute of Physics (AIP)
dc.sourceApplied Physics Letters
dc.titleNitrogen-induced enhancement of the free electron concentration in Sulfur implanted GaNxAs1-x
dc.typeJournal article
local.bibliographicCitation.lastpage2860
local.bibliographicCitation.startpage2858
local.contributor.affiliationYu, Kin Man, Lawrence Livermore National Laboratory
local.contributor.affiliationWalukiewicz, W, Lawrence Berkeley National Laboratory
local.contributor.affiliationShan, Wei, OptiWork, Inc.
local.contributor.affiliationWu, J, Lawrence Berkeley National Laboratory
local.contributor.affiliationAger, J W, Lawrence Berkeley National Laboratory
local.contributor.affiliationHaller, E E, University of California
local.contributor.affiliationGarza, J, Texas Tech University
local.contributor.affiliationRidgway, Mark C, College of Physical and Mathematical Sciences, ANU
local.contributor.authoruidRidgway, Mark C, u9001886
local.description.embargo2037-12-31
local.description.notesImported from ARIES
local.description.refereedYes
local.identifier.absfor020204 - Plasma Physics; Fusion Plasmas; Electrical Discharges
local.identifier.ariespublicationMigratedxPub20301
local.identifier.citationvolume77
local.identifier.scopusID2-s2.0-0001644919
local.type.statusPublished Version

Downloads

Original bundle

Now showing 1 - 1 of 1
Loading...
Thumbnail Image
Name:
01_Yu_Nitrogen-induced_enhancement_2000.pdf
Size:
407.32 KB
Format:
Adobe Portable Document Format