Nitrogen-induced enhancement of the free electron concentration in Sulfur implanted GaNxAs1-x
| dc.contributor.author | Yu, Kin Man | |
| dc.contributor.author | Walukiewicz, W | |
| dc.contributor.author | Shan, Wei | |
| dc.contributor.author | Wu, J | |
| dc.contributor.author | Ager, J W | |
| dc.contributor.author | Haller, E E | |
| dc.contributor.author | Garza, J | |
| dc.contributor.author | Ridgway, Mark C | |
| dc.date.accessioned | 2015-12-13T23:18:09Z | |
| dc.date.issued | 2000 | |
| dc.date.updated | 2015-12-12T08:55:39Z | |
| dc.description.abstract | We have achieved a large increase of the activation efficiency of sulfur atoms implanted into GaNxAs1-x thin films. For thin films with only 0.8% N content, we find a maximum free electron concentration of >6×1018cm-3 for implanted S concentration higher | |
| dc.identifier.issn | 0003-6951 | |
| dc.identifier.uri | http://hdl.handle.net/1885/90035 | |
| dc.publisher | American Institute of Physics (AIP) | |
| dc.source | Applied Physics Letters | |
| dc.title | Nitrogen-induced enhancement of the free electron concentration in Sulfur implanted GaNxAs1-x | |
| dc.type | Journal article | |
| local.bibliographicCitation.lastpage | 2860 | |
| local.bibliographicCitation.startpage | 2858 | |
| local.contributor.affiliation | Yu, Kin Man, Lawrence Livermore National Laboratory | |
| local.contributor.affiliation | Walukiewicz, W, Lawrence Berkeley National Laboratory | |
| local.contributor.affiliation | Shan, Wei, OptiWork, Inc. | |
| local.contributor.affiliation | Wu, J, Lawrence Berkeley National Laboratory | |
| local.contributor.affiliation | Ager, J W, Lawrence Berkeley National Laboratory | |
| local.contributor.affiliation | Haller, E E, University of California | |
| local.contributor.affiliation | Garza, J, Texas Tech University | |
| local.contributor.affiliation | Ridgway, Mark C, College of Physical and Mathematical Sciences, ANU | |
| local.contributor.authoruid | Ridgway, Mark C, u9001886 | |
| local.description.embargo | 2037-12-31 | |
| local.description.notes | Imported from ARIES | |
| local.description.refereed | Yes | |
| local.identifier.absfor | 020204 - Plasma Physics; Fusion Plasmas; Electrical Discharges | |
| local.identifier.ariespublication | MigratedxPub20301 | |
| local.identifier.citationvolume | 77 | |
| local.identifier.scopusID | 2-s2.0-0001644919 | |
| local.type.status | Published Version |
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