Local digital etching and infiltration for tuning of a H1- Cavity in deeply etched InP/InGaAsP/InP photonic crystals

dc.contributor.authorKicken, H H J E
dc.contributor.authorAlkemade, P.F.A.
dc.contributor.authorvan der Heijden, Rob W.
dc.contributor.authorKarouta, Fouad
dc.contributor.authorNötzel, Richard
dc.contributor.authorvan der Drift, E.
dc.contributor.authorSalemink, H W M
dc.coverage.spatialNewport Beach, CA
dc.date.accessioned2015-12-13T22:19:26Z
dc.date.createdMay 10-14 2009
dc.date.issued2009
dc.date.updated2016-02-24T10:04:11Z
dc.description.abstractLocal post-production processing of single holes in a planar photonic crystal is demonstrated by selectively opening a masking layer by focused ion beam milling. Local tuning was optically demonstrated by both blueshifting and subsequent red-shifting the
dc.identifier.isbn9781424434336
dc.identifier.urihttp://hdl.handle.net/1885/71795
dc.publisherIEEE
dc.relation.ispartofseriesIEEE International Conference on Indium Phosphide and Related Materials, IPRM 2009
dc.sourceConference Proceedings - International Conference on Indium Phosphide and Related Materials
dc.subjectKeywords: Focused ion beam milling; Local tuning; Masking layers; Planar photonic crystal; Post processing; Post-production; Q-factors; Resonance frequencies; Resonant frequencies; Selective tuning; Single hole; Indium; Indium phosphide; Natural frequencies; Point
dc.titleLocal digital etching and infiltration for tuning of a H1- Cavity in deeply etched InP/InGaAsP/InP photonic crystals
dc.typeConference paper
local.bibliographicCitation.lastpage34
local.bibliographicCitation.startpage31
local.contributor.affiliationKicken, H H J E, Eindhoven University of Technology
local.contributor.affiliationAlkemade, P.F.A., Delft University of Technology
local.contributor.affiliationvan der Heijden, Rob W., Eindhoven University of Technology
local.contributor.affiliationKarouta, Fouad, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationNötzel, Richard, Eindhoven University of Technology
local.contributor.affiliationvan der Drift, E., Delft University of Technology
local.contributor.affiliationSalemink, H W M, Delft University of Technology
local.contributor.authoremailu4703981@anu.edu.au
local.contributor.authoruidKarouta, Fouad, u4703981
local.description.embargo2037-12-31
local.description.notesImported from ARIES
local.description.refereedYes
local.identifier.absfor020504 - Photonics, Optoelectronics and Optical Communications
local.identifier.absseo970102 - Expanding Knowledge in the Physical Sciences
local.identifier.ariespublicationU3488905xPUB2886
local.identifier.doi10.1109/ICIPRM.2009.5012419
local.identifier.scopusID2-s2.0-70349498484
local.identifier.uidSubmittedByU3488905
local.type.statusPublished Version

Downloads

Original bundle

Now showing 1 - 1 of 1
No Thumbnail Available
Name:
01_Kicken_Local_digital_etching_and_2009.pdf
Size:
303.7 KB
Format:
Adobe Portable Document Format
Back to topicon-arrow-up-solid
 
APRU
IARU
 
edX
Group of Eight Member

Acknowledgement of Country

The Australian National University acknowledges, celebrates and pays our respects to the Ngunnawal and Ngambri people of the Canberra region and to all First Nations Australians on whose traditional lands we meet and work, and whose cultures are among the oldest continuing cultures in human history.


Contact ANUCopyrightDisclaimerPrivacyFreedom of Information

+61 2 6125 5111 The Australian National University, Canberra

TEQSA Provider ID: PRV12002 (Australian University) CRICOS Provider Code: 00120C ABN: 52 234 063 906