Sidewall slopes of SU-8 HARMST using deep x-ray lithography
Date
2008
Authors
Vora, Kaushal
Shew, B.Y.
Harvey, E.C.
Hayes, J.P.
Peele, Andrew Gareth
Journal Title
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Volume Title
Publisher
IOP Publishing
Abstract
We describe a model that predicts sidewall slope in SU-8 high aspect ratio microstructures made using x-ray lithography. Our experimental results are in accordance with our model and we demonstrate that essentially zero sidewall taper can be obtained under certain conditions. We use our results to explore the feasibility of optimizing a structure simultaneously for slope and surface roughness.
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Keywords
Keywords: Aspect ratio; Mathematical models; Microstructure; Optimization; Surface roughness; Aspect ratio microstructures; X-ray lithography; Lithography
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Source
Journal of Micromechanics and Microengineering
Type
Journal article
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Restricted until
2037-12-31
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