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Sidewall slopes of SU-8 HARMST using deep x-ray lithography

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Date

2008

Authors

Vora, Kaushal
Shew, B.Y.
Harvey, E.C.
Hayes, J.P.
Peele, Andrew Gareth

Journal Title

Journal ISSN

Volume Title

Publisher

IOP Publishing

Abstract

We describe a model that predicts sidewall slope in SU-8 high aspect ratio microstructures made using x-ray lithography. Our experimental results are in accordance with our model and we demonstrate that essentially zero sidewall taper can be obtained under certain conditions. We use our results to explore the feasibility of optimizing a structure simultaneously for slope and surface roughness.

Description

Keywords

Keywords: Aspect ratio; Mathematical models; Microstructure; Optimization; Surface roughness; Aspect ratio microstructures; X-ray lithography; Lithography

Citation

URI

http://hdl.handle.net/1885/61052

Collections

ANU Research Publications

Source

Journal of Micromechanics and Microengineering

Type

Journal article

Book Title

Entity type

Access Statement

License Rights

DOI

10.1088/0960-1317/18/3/035037

Restricted until

2037-12-31

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01_Vora_Sidewall_slopes_of_SU-8_HARMST_2008.pdf (621.87 KB)

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