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Low loss stoichiometric TeO2 thin films and waveguides

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Date

2009

Authors

Vu, Khu
Madden, Steve
Luther-Davies, Barry

Journal Title

Journal ISSN

Volume Title

Publisher

Institute of Electrical and Electronics Engineers (IEEE Inc)

Abstract

Stoichiometric low loss Tellurium dioxide, TeO2, films have been produced by reactive magnetron RF sputtering. Long rib waveguides with very low loss are fabricated using reactive ion etching techniques. As-deposited TeO2 films and waveguides with propagation loss around or below 0.1dB/cm at 1550nm have been achieved.

Description

Keywords

Keywords: 1550 nm; Low loss; Propagation loss; Reactive ion; Rf-sputtering; Rib waveguides; Tellurium dioxide; Electron optics; Lasers; Quantum electronics; Tellurium; Tellurium compounds; Waveguides; Reactive ion etching

Citation

URI

http://hdl.handle.net/1885/54086

Collections

ANU Research Publications

Source

Proceedings of CLEO / Europe-EQEC 2009

Type

Conference paper

Book Title

Entity type

Access Statement

License Rights

DOI

Restricted until

2037-12-31

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01_Vu_Low_loss_stoichiometric_TeO2_2009.pdf (443.98 KB)

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