Characterization of deep level traps responsible for isolation of proton implanted GaAs
Date
2003-03-15
Authors
Boudinov, H
Coelho, A V P
Jagadish, Chennupati
Tan, Hark Hoe
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American Institute of Physics
Abstract
Deep level transient spectroscopy was employed to determine the electrical properties of defects induced in metalorganic chemical-vapor deposition grown n-type and p-type GaAs during proton bombardment. Thermal stability of these defects was investigated and correlation with defects responsible for isolation of GaAs by ion bombardment was discussed. The annealing temperature region (220–250 °C) is similar to proton isolated GaAs below the threshold dose for complete isolation. At least four of the five traps observed in n-type GaAs are not simple interstitial-vacancy pairs. For p-type GaAs we have observed an unknown level with apparent energy of ~0.64 eV.
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Keywords
gallium arsenide, III-V semiconductors, deep levels, deep level transient spectroscopy, thermal stability, defect states, proton effects, ion implantation, MOCVD coatings, annealing
Citation
Journal of Applied Physics 93.6 (2003): 3234-8
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Journal of Applied Physics
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Journal article
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