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Strong photosensitivity in tin-doped silica films

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dc.contributor.authorGaff, K
dc.contributor.authorMariman, Elaine
dc.contributor.authorDall (previously Weijers), Tessica
dc.contributor.authorLove, John
dc.contributor.authorBoswell, Roderick
dc.date.accessioned2015-12-13T23:18:37Z
dc.date.available2015-12-13T23:18:37Z
dc.date.issued2000
dc.date.updated2015-12-12T08:57:39Z
dc.description.abstractThe observation is reported of a strong negative change in the refractive index of tin-doped thin silica films deposited by helicon activated reactive evaporation. Samples with concentrations between 5 and 25 mol% SnO2 were exposed to 2kJ/cm2 of 248 nm UV radiation. Negative refractive index changes as large as -2.7 × 10-3 were observed on irradiation.
dc.identifier.issn0013-5194
dc.identifier.urihttp://hdl.handle.net/1885/90261
dc.publisherInstitute of Electrical and Electronics Engineers (IEEE Inc)
dc.sourceElectronics Letters
dc.subjectKeywords: Evaporation; Excimer lasers; Low temperature operations; Optical fibers; Photosensitivity; Refractive index; Semiconductor doping; Silica; Systematic errors; Tin; Ultraviolet radiation; Helicon activated reactive evaporation; Negative index refractive; Ti
dc.titleStrong photosensitivity in tin-doped silica films
dc.typeJournal article
local.bibliographicCitation.issue9
local.bibliographicCitation.lastpage843
local.bibliographicCitation.startpage842
local.contributor.affiliationGaff, K, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationMariman, Elaine, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationDall (previously Weijers), Tessica, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationLove, John, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationBoswell, Roderick, College of Physical and Mathematical Sciences, ANU
local.contributor.authoruidGaff, K, u9701778
local.contributor.authoruidMariman, Elaine, u940256
local.contributor.authoruidDall (previously Weijers), Tessica, u9905670
local.contributor.authoruidLove, John, u7501719
local.contributor.authoruidBoswell, Roderick, u8000743
local.description.notesImported from ARIES
local.description.refereedYes
local.identifier.absfor090699 - Electrical and Electronic Engineering not elsewhere classified
local.identifier.ariespublicationMigratedxPub20574
local.identifier.citationvolume36
local.identifier.doi10.1049/el:20000574
local.identifier.scopusID2-s2.0-0033742988
local.type.statusPublished Version

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