Determination of thickness and composition of high-k dielectrics using high-energy electrons
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Grande, Pedro
Vos, Maarten
Venkatachalam, Dinesh
Nandi, Sanjoy
Elliman, Robert
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American Institute of Physics (AIP)
Abstract
We demonstrate the application of high-energy elastic electron backscattering to the analysis of thin (2-20 nm) HfO2 overlayers on oxidized Si substrates. The film composition and thickness are determined directly from elastic scattering peaks characteris
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Applied Physics Letters
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Open Access
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