Effect of low Ge content on B diffusion in amorphous SiGe alloys
| dc.contributor.author | Edelman, L A | |
| dc.contributor.author | Elliman, Robert | |
| dc.contributor.author | Rubin, L | |
| dc.contributor.author | Washington, L | |
| dc.contributor.author | Jones, K S | |
| dc.date.accessioned | 2015-12-08T22:27:01Z | |
| dc.date.available | 2015-12-08T22:27:01Z | |
| dc.date.issued | 2008 | |
| dc.date.updated | 2015-12-08T09:16:34Z | |
| dc.description.abstract | Diffusion of B in amorphous Si is known to be four orders of magnitude higher than in crystalline Si. The effect of Ge at low concentrations on B diffusion in the amorphous phase is unknown. 1.5 μm thick relaxed layers of varying SiGe alloys (0, 6, 12, a | |
| dc.identifier.issn | 1071-1023 | |
| dc.identifier.uri | http://hdl.handle.net/1885/33890 | |
| dc.publisher | American Institute of Physics (AIP) | |
| dc.source | Journal of Vacuum Science and Technology B | |
| dc.subject | Keywords: Orders of magnitude; Preexponential factors; Solid phase epitaxial regrowth; Strain-relaxed crystalline; Amorphous alloys; Crystalline materials; Diffusion; Epitaxial growth; Recrystallization (metallurgy); Secondary ion mass spectrometry; Germanium compo | |
| dc.title | Effect of low Ge content on B diffusion in amorphous SiGe alloys | |
| dc.type | Journal article | |
| local.bibliographicCitation.issue | 1 | |
| local.bibliographicCitation.lastpage | 337 | |
| local.bibliographicCitation.startpage | 333 | |
| local.contributor.affiliation | Edelman, L A, University of Florida | |
| local.contributor.affiliation | Elliman, Robert, College of Physical and Mathematical Sciences, ANU | |
| local.contributor.affiliation | Rubin, L, Axcelis Technologies | |
| local.contributor.affiliation | Washington, L, Sunnyvale | |
| local.contributor.affiliation | Jones, K S , University of Florida | |
| local.contributor.authoruid | Elliman, Robert, u9012877 | |
| local.description.notes | Imported from ARIES | |
| local.identifier.absfor | 091207 - Metals and Alloy Materials | |
| local.identifier.ariespublication | u3488905xPUB107 | |
| local.identifier.citationvolume | 26 | |
| local.identifier.doi | 10.1116/1.2781511 | |
| local.identifier.scopusID | 2-s2.0-38849198038 | |
| local.identifier.thomsonID | 000253399000064 | |
| local.type.status | Published Version |