Substrate-dependent structure, microstructure, composition and properties of nanostructured TiN films
Date
2011
Authors
Mangalampalli, S.R.N. Kiran
Krishna, Ghanashyam
Padmanabhan, K.A.
Journal Title
Journal ISSN
Volume Title
Publisher
Pergamon-Elsevier Ltd
Abstract
Titanium nitride films of a thickness of ∼1.5 μm were deposited on amorphous and crystalline substrates by DC reactive magnetron sputtering at ambient temperature with 100% nitrogen in the sputter gas. The growth of nanostructured, i.e. crystalline nan
Description
Keywords
Keywords: A. Thin films; Ambient temperatures; Amorphous substrate; Chemical compositions; Crystalline substrates; D. Mechanical properties; D. Optical properties; DC reactive magnetron sputtering; Different substrates; Lanthanum aluminate; Lower hardness; Modulus A. Thin films; D. Mechanical properties; D. Optical properties
Citation
Collections
Source
Solid State Communications
Type
Journal article
Book Title
Entity type
Access Statement
License Rights
Restricted until
2037-12-31