Substrate-dependent structure, microstructure, composition and properties of nanostructured TiN films
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Mangalampalli, S.R.N. Kiran
Krishna, Ghanashyam
Padmanabhan, K.A.
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Pergamon-Elsevier Ltd
Abstract
Titanium nitride films of a thickness of ∼1.5 μm were deposited on amorphous and crystalline substrates by DC reactive magnetron sputtering at ambient temperature with 100% nitrogen in the sputter gas. The growth of nanostructured, i.e. crystalline nan
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Solid State Communications
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2037-12-31