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Substrate-dependent structure, microstructure, composition and properties of nanostructured TiN films

Date

Authors

Mangalampalli, S.R.N. Kiran

Krishna, Ghanashyam

Padmanabhan, K.A.

Publisher

Pergamon-Elsevier Ltd

Abstract

Titanium nitride films of a thickness of ∼1.5 μm were deposited on amorphous and crystalline substrates by DC reactive magnetron sputtering at ambient temperature with 100% nitrogen in the sputter gas. The growth of nanostructured, i.e. crystalline nan

Keywords

Keywords: A. Thin films; Ambient temperatures; Amorphous substrate; Chemical compositions; Crystalline substrates; D. Mechanical properties; D. Optical properties; DC reactive magnetron sputtering; Different substrates; Lanthanum aluminate; Lower hardness; Modulus A. Thin films; D. Mechanical properties; D. Optical properties

URI

http://hdl.handle.net/1885/66676

Collections

ANU Research Publications

Source

Solid State Communications

Type

Journal article

DOI

10.1016/j.ssc.2011.01.009

Restricted until

2037-12-31

Downloads

File

Description

01_Mangalampalli_Substrate-dependent_structure,_2011.pdf (719.46 KB)