Charge Density in Atmospheric Pressure Chemical Vapor Deposition TiO 2 on SiO 2 -Passivated Silicon
| dc.contributor.author | McIntosh, Keith | |
| dc.contributor.author | Baker-Finch, Simeon | |
| dc.contributor.author | Grant, Nicholas | |
| dc.contributor.author | Thomson, Andrew | |
| dc.contributor.author | Singh, Sonita | |
| dc.contributor.author | Baikie, Iain D. | |
| dc.date.accessioned | 2015-12-08T22:38:05Z | |
| dc.date.issued | 2009 | |
| dc.date.updated | 2016-02-24T11:17:24Z | |
| dc.description.abstract | The charge density of a TiO2 film deposited on a SiO2 -passivated silicon wafer is determined. The TiO2 is deposited by atmospheric pressure chemical vapor deposition at 400°C, and the SiO2 is grown thermally at 950°C. This TiO2 - SiO2 stack is a useful | |
| dc.identifier.issn | 0013-4651 | |
| dc.identifier.uri | http://hdl.handle.net/1885/35794 | |
| dc.publisher | Electrochemical Society Inc | |
| dc.source | Journal of the Electrochemical Society | |
| dc.subject | Keywords: Atmospheric pressure chemical vapor deposition; Capacitance voltage; Conservative limits; Front surfaces; High-efficiency solar cells; Kelvin Probe measurements; Low density; Optical transmissions; Photoconductance; TiO; Upper limits; Atmospheric chemistr | |
| dc.title | Charge Density in Atmospheric Pressure Chemical Vapor Deposition TiO 2 on SiO 2 -Passivated Silicon | |
| dc.type | Journal article | |
| local.bibliographicCitation.issue | 11 | |
| local.bibliographicCitation.lastpage | G195 | |
| local.bibliographicCitation.startpage | G190 | |
| local.contributor.affiliation | McIntosh, Keith, College of Engineering and Computer Science, ANU | |
| local.contributor.affiliation | Baker-Finch, Simeon, College of Medicine, Biology and Environment, ANU | |
| local.contributor.affiliation | Grant, Nicholas, College of Engineering and Computer Science, ANU | |
| local.contributor.affiliation | Thomson, Andrew, College of Engineering and Computer Science, ANU | |
| local.contributor.affiliation | Singh, Sonita, College of Engineering and Computer Science, ANU | |
| local.contributor.affiliation | Baikie, Iain D, KP Technology Limited | |
| local.contributor.authoruid | McIntosh, Keith, u4249405 | |
| local.contributor.authoruid | Baker-Finch, Simeon, u3938976 | |
| local.contributor.authoruid | Grant, Nicholas, u4488538 | |
| local.contributor.authoruid | Thomson, Andrew, u4323527 | |
| local.contributor.authoruid | Singh, Sonita, u4090724 | |
| local.description.embargo | 2037-12-31 | |
| local.description.notes | Imported from ARIES | |
| local.identifier.absfor | 050200 - ENVIRONMENTAL SCIENCE AND MANAGEMENT | |
| local.identifier.ariespublication | u4692404xPUB128 | |
| local.identifier.citationvolume | 156 | |
| local.identifier.doi | 10.1149/1.3216029 | |
| local.identifier.scopusID | 2-s2.0-70349742577 | |
| local.identifier.thomsonID | 000270457600057 | |
| local.type.status | Published Version |
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