Laser-induced microexplosion confined in a bulk of silica: formation of nanovoids
Date
2006-05-16
Authors
Juodkazis, Saulius
Misawa, Hiroaki
Hashimoto, Tomohiro
Gamaly, Eugene G
Luther-Davies, Barry
Journal Title
Journal ISSN
Volume Title
Publisher
American Institute of Physics (AIP)
Abstract
We report on the nanovoid formation inside synthetic silica, viosil, by single femtosecond pulses of 30–100nJ energy, 800nm wavelength, and 180fs duration. It is demonstrated that the void is formed as a result of shock and rarefaction waves at pulse power much lower than the threshold of self-focusing. The shock-compressed region around the nanovoid is demonstrated to have higher chemical reactivity. This was used to reveal the extent of the shock-compressed region by wet etching. Application potential of nanostructuring of dielectrics is discussed.
Description
Keywords
Keywords: Chemical reactions; Dielectric materials; Etching; Nanostructured materials; Shock waves; Laser-induced microexplosion; Nanovoids; Synthetic silica; Silica
Citation
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Source
Applied Physics Letters
Type
Journal article