Laser-induced microexplosion confined in a bulk of silica: formation of nanovoids

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dc.contributor.authorJuodkazis, Saulius
dc.contributor.authorMisawa, Hiroaki
dc.contributor.authorHashimoto, Tomohiro
dc.contributor.authorGamaly, Eugene G
dc.contributor.authorLuther-Davies, Barry
dc.date.accessioned2015-12-21T03:45:56Z
dc.date.available2015-12-21T03:45:56Z
dc.date.issued2006-05-16
dc.date.updated2016-02-24T12:14:33Z
dc.description.abstractWe report on the nanovoid formation inside synthetic silica, viosil, by single femtosecond pulses of 30–100nJ energy, 800nm wavelength, and 180fs duration. It is demonstrated that the void is formed as a result of shock and rarefaction waves at pulse power much lower than the threshold of self-focusing. The shock-compressed region around the nanovoid is demonstrated to have higher chemical reactivity. This was used to reveal the extent of the shock-compressed region by wet etching. Application potential of nanostructuring of dielectrics is discussed.
dc.identifier.issn0003-6951en_AU
dc.identifier.urihttp://hdl.handle.net/1885/95137
dc.publisherAmerican Institute of Physics (AIP)
dc.rightshttp://www.sherpa.ac.uk/romeo/issn/0003-6951..."Publishers version/PDF may be used on author's personal website, institutional website or institutional repository" from SHERPA/RoMEO site (as at 21/12/15). Copyright 2006 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Applied Physics Letters and may be found at https://doi.org/10.1063/1.2204847
dc.sourceApplied Physics Letters
dc.subjectKeywords: Chemical reactions; Dielectric materials; Etching; Nanostructured materials; Shock waves; Laser-induced microexplosion; Nanovoids; Synthetic silica; Silica
dc.titleLaser-induced microexplosion confined in a bulk of silica: formation of nanovoids
dc.typeJournal article
local.bibliographicCitation.issue20en_AU
local.bibliographicCitation.startpage201909en_AU
local.contributor.affiliationMisawa, Hiroaki, Hokkaido University, Japanen_AU
local.contributor.affiliationJuodkazis, Saulius, Hokkaido University, Japanen_AU
local.contributor.affiliationHashimoto, Tomohiro, Ohara Inc, Japanen_AU
local.contributor.affiliationGamaly, Eugene G, College of Physical and Mathematical Sciences, CPMS Research School of Physics and Engineering, Laser Physics Centre, The Australian National Universityen_AU
local.contributor.affiliationLuther-Davies, Barry, College of Physical and Mathematical Sciences, CPMS Research School of Physics and Engineering, Laser Physics Centre, The Australian National Universityen_AU
local.contributor.authoremaileugene.gamaly@anu.edu.auen_AU
local.contributor.authoruidu4018091en_AU
local.description.notesImported from ARIESen_AU
local.identifier.absfor020604en_AU
local.identifier.absfor020406en_AU
local.identifier.ariespublicationu9912193xPUB18en_AU
local.identifier.citationvolume88en_AU
local.identifier.doi10.1063/1.2204847en_AU
local.identifier.scopusID2-s2.0-33646871569
local.identifier.uidSubmittedByu3488905en_AU
local.publisher.urlhttps://www.aip.org/en_AU
local.type.statusPublished Versionen_AU

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