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Surface passivation by atomic-layer-deposited Al 2 O 3 /TiO 2 stacks

Suh, Dong Chul; Choi, Duk-Yong; Yu, Jun X; Liang, Wensheng; Weber, Klaus


A detailed study of the passivation quality of Al2O3 and TiO2 stacks on boron-doped emitters, where the stacks were deposited by thermal atomic layer deposition. The passivation quality was studied for different post-TiO2 anneal temperature, as a function

CollectionsANU Research Publications
Date published: 2013
Type: Conference paper
Source: Conference Record of the IEEE Photovoltaic Specialists Conference
DOI: 10.1109/PVSC.2013.6744381


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