Surface passivation by atomic-layer-deposited Al 2 O 3 /TiO 2 stacks
Date
2013
Authors
Suh, Dong Chul
Yu, Jun X
Liang, Wensheng
Weber, Klaus
Choi, Duk-Yong
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IEEE
Abstract
A detailed study of the passivation quality of Al2O3 and TiO2 stacks on boron-doped emitters, where the stacks were deposited by thermal atomic layer deposition. The passivation quality was studied for different post-TiO2 anneal temperature, as a function
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Conference Record of the IEEE Photovoltaic Specialists Conference
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Conference paper
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2037-12-31
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