Open Research

Characterization of low pressure chemical vapour deposited Si3N4 films

dc.contributor.author	Jin, Hao
dc.contributor.author	Weber, Klaus
dc.contributor.author	Blakers, Andrew
dc.coverage.spatial	Canberra Australia
dc.date.accessioned	2015-12-07T22:54:22Z
dc.date.created	September 13-15 2006
dc.identifier.isbn	0975065041
dc.identifier.uri	http://hdl.handle.net/1885/28162
dc.publisher	Australian and New Zealand Solar Energy Society (ANZSES)
dc.relation.ispartofseries	Australia and New Zealand Solar Energy Society Conference (Solar 2006)
dc.source	Proceedings of the Conference of the Australia and New Zealand Solar Energy Society (Solar 2006)
dc.source.uri	http://www.anzses.org
dc.title	Characterization of low pressure chemical vapour deposited Si3N4 films
dc.type	Conference paper
local.description.notes	Imported from ARIES
local.description.refereed	Yes
dc.date.issued	2006
local.identifier.absfor	091299 - Materials Engineering not elsewhere classified
local.identifier.absfor	090699 - Electrical and Electronic Engineering not elsewhere classified
local.identifier.ariespublication	u4251866xPUB56
local.type.status	Published Version
local.contributor.affiliation	Jin, Hao, College of Engineering and Computer Science, ANU
local.contributor.affiliation	Weber, Klaus, College of Engineering and Computer Science, ANU
local.contributor.affiliation	Blakers, Andrew, College of Engineering and Computer Science, ANU
local.description.embargo	2037-12-31
local.bibliographicCitation.startpage	1
local.bibliographicCitation.lastpage	5
local.identifier.absseo	850504 - Solar-Photovoltaic Energy
dc.date.updated	2015-12-07T12:49:50Z
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