Photoluminescence in er-doped Ge-As-Se chalcogenide thin films
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Yan, Kunlun
Wang, Rongping
Vu, Khu
Elliman, Robert
Belay, Kidane
Luther-Davies, Barry
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We report ion-implanted Er ions into Ge11.5As24Se64.5 thin films with different doses, and subsequently thermal-annealed the films with di fferent times. The characterization results indicated that the thickness, refractive index and optical bandgap o f the films can be stabilized with 3 hour thermal annealing. The 1.5 μm emission arising from the 4I13/2→4I15/2 transition was observed and a lifetime of 1.35 ms was obtained in films annealed at 180°C.
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Conference on Lasers and Electro-Optics/Pacific Rim, CLEOPR 2011
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