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Surface passivation of black silicon by thermal ALD deposited aluminum oxide

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Date

2011

Authors

Otto, M.
Kroll, M.
Käsebier, T.
Ernst, M.
Salzer, R.
Wehrspohn, R. B.

Journal Title

Journal ISSN

Volume Title

Publisher

Optica Publishing Group

Access Statement

Research Projects

Organizational Units

Journal Issue

Abstract

Black silicon (bSi) surfaces can be effectivly passivated by thermal ALD. The nanosturcures with aspect ratios up to 10 show excellent anti-reflection and light-trapping properties with absorption in the visible spectrum of over 97%.

Description

Keywords

Citation

URI

https://hdl.handle.net/1885/733812234

Collections

ANU Research Publications

Source

Type

Conference paper

Book Title

Optical Instrumentation for Energy and Environmental Applications 2011: Renewable Energy and the Environment

Entity type

Publication

Access Statement

License Rights

DOI

10.1364/e2.2011.jwe7

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