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Large phase shifts in As₂S₃ waveguides for all-optical processing devices

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Date

2005

Authors

Ruan, Yinlan
Luther-Davies, Barry
Li, Weitang
Rode, Andrei
Kolev, Vesslin
Madden, Steve

Journal Title

Journal ISSN

Volume Title

Publisher

Optical Society of America

Abstract

A large phase shift of 4.7𝜋 at 1.53 𝜇m has been observed from a low-loss (0.2 dB⁄cm), small-core As₂S3₃ waveguide fabricated by dry etching. The strength of the nonlinear response was limited by photosensitivity and photocrystallization of the As₂S₃ films at 1.53 𝜇m, far below the material bandgap.

Description

Keywords

Keywords: Arsenic compounds; Crystallization; Dry etching; Nonlinear optics; Optical devices; Optical engineering; Optical waveguides; Photosensitivity; Thin films; Bandgaps; Nonlinear response; Photocrystallization; Waveguide formation; Phase shift

Citation

URI

http://hdl.handle.net/1885/101455

Collections

ANU Research Publications

Source

Optics Letters

Type

Journal article

Book Title

Entity type

Access Statement

License Rights

DOI

10.1364/OL.30.002605

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