Te-based chalcogenide films with high thermal stability for phase change memory

Authors

Wang, Guoxiang
Shen, Xiang
Nie, Qiuhua
Chen, Fen
Wang, Xunsi
Fu, Jing
Chen, Yu
Xu, Tiefeng
Dai, Shixun
Zhang, Wei

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American Institute of Physics

Abstract

This study reports on the synthesis of tellurium-based chalcogenide films that have high thermal stability for phase change memory application. Several Te-based chalcogenide alloys of In-Bi-Te, Ag-Bi-Te, In-Sb-Te, Sn-Sb-Te, Zn-Ge-Te, and Ga-Ge-Te are reported. Their thermal, optical, and electrical properties are investigated. The results show that Bi-Te-based films have a higher crystallization temperature and greater activation energy compared with the other Sb-Te-based and Ge-Te-based films. Especially, In₂.₈Bi₃₆.₆Te₆₀.₆film exhibits high crystallization temperature (252 °C) and great activation energy (5.16 eV), showing much improved amorphous thermal stability. A relatively wider optical band gap (0.674 eV) of thermal annealed In₂.₈Bi₃₆.₆Te₆₀.₆film is obtained. In addition, it also has a higher amorphous/crystalline resistance ratio of about 10⁵, implying that current consumption could be low in the phase-change memory operation.

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Journal of Applied Physics

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