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Optical nonlinearity of oxygen-rich SiO x thin films

Date

Authors

Li, Wei

Boswell, Roderick

Samoc, Marek

Samoc, Anna

Qin, Qing Hua

Publisher

Institute of Electrical and Electronics Engineers (IEEE Inc)

Abstract

Highly oxygen-rich SiOx thin films were prepared using a helicon plasma activated reactive evaporation technique. A small second-order optical nonlinearity was observed in the as-grown films, and thermal poling induced nonlinearity in the films was found

Keywords

Keywords: Defects; Evaporation; Silicon compounds; Stoichiometry; Thin films; Helicon plasma activated reactive evaporation; Non-impurity defects; Optical nonlinearity; Oxygen-rich films; Thermal poling; Nonlinear optics

URI

http://hdl.handle.net/1885/55584

Collections

ANU Research Publications

Source

Electronics Letters

Type

Journal article

DOI

10.1049/el:20073668

Restricted until

2037-12-31

Downloads

File

Description

01_Li_Optical_nonlinearity_of_2007.pdf (112.89 KB)