Investigating ion release using inline ICP during in situ scratch testing of an Mg-Li(-Al-Y-Zr) alloy
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Authors
Yan, Yuanming
Zhou, Peng
Gharbi, Oumaïma
Zeng, Zhuoran
Chen, Xiaobo
Volovitch, Polina
Ogle, Kevin
Birbilis, Nick
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Elsevier
Abstract
An electrochemical flow cell was constructed to permit the application of a mechanical scratch to the exposed
material while monitoring the open circuit dissolution rates of the elemental alloy components. Elemental
dissolution rates were determined where measured downstream using inductively coupled plasma atomic
emission spectrometry (ICP-AES). The technique is demonstrated with Mg-Li(-Al-Y-Zr) alloy exposed to 0.01 M
NaCl. A mechanical scratch was applied manually using a non-conductive and non-contaminating sapphire
lancet without interrupting the on-line measurement. The ion dissolution rate from the newly exposed surface
was significantly higher than the dissolution rate from the remaining surface area, corresponding to a high local
current density. Notably, the increase in the dissolution rate from the scratched area occurred gradually after the
scratch; then subsided within 200 s after the scratch, indicating that this particular Mg-alloy can repassivate by
the formation of a surface film after a scratch was applied. This is the first reported use of an in situ scratch cell
coupled with ICP-AES.
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Electrochemistry Communications
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Open Access