Current-free double-layer formation in a high-density helicon discharge

dc.contributor.authorCharles, Christine
dc.contributor.authorBoswell, Rod
dc.date.accessioned2015-10-09T03:38:18Z
dc.date.available2015-10-09T03:38:18Z
dc.date.issued2003-03-03
dc.date.updated2015-12-12T08:19:52Z
dc.description.abstractA strong, current-free, electric double-layer with eΦ/kTe∼3 and a thickness of less than 50 debye lengths has been experimentally observed in an expanding, high-density helicon sustained rf (13.56-MHz) discharge. The rapid potential decrease is associated with the “neck” of the vacuum vessel, where the glass source tube joins the aluminumdiffusionchamber, and is only observed when the argon gas pressure is less than about 0.5 mTorr. The upstream electron temperature Te appears 25% greater than the downstream Te, and there is a density hole on the downstream edge. This experiment differs from others in that the potentials are self-consistently generated by the plasma itself, and there is no current flowing through an external circuit. The plasma electrons are heated by the rf fields in the source, provide the power to maintain the double-layer, and hence accelerate ions created in the source out into the diffusionchamber.
dc.identifier.issn0003-6951en_AU
dc.identifier.urihttp://hdl.handle.net/1885/15846
dc.publisherAmerican Institute of Physics (AIP)
dc.rightshttp://www.sherpa.ac.uk/romeo/issn/0003-6951..."Publishers version/PDF may be used on author's personal website, institutional website or institutional repository" from SHERPA/RoMEO site (as at 8/10/15). Copyright 2003 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Applied Physics Letters and may be found at https://doi.org/10.1063/1.1557319
dc.sourceApplied Physics Letters
dc.subjectKeywords: Diffusion; Electrons; Magnetic fields; Plasma density; Plasmas; Electric double layers (EDL); Helicons
dc.titleCurrent-free double-layer formation in a high-density helicon discharge
dc.typeJournal article
local.bibliographicCitation.issue9en_AU
local.bibliographicCitation.lastpage1358en_AU
local.bibliographicCitation.startpage1356en_AU
local.contributor.affiliationCharles, Christine, College of Physical and Mathematical Sciences, CPMS Research School of Physics and Engineering, Plasma Research Laboratory, The Australian National Universityen_AU
local.contributor.affiliationBoswell, Roderick, College of Physical and Mathematical Sciences, CPMS Research School of Physics and Engineering, Plasma Research Laboratory, The Australian National Universityen_AU
local.contributor.authoruidu4025692en_AU
local.description.notesImported from ARIESen_AU
local.description.refereedYes
local.identifier.absfor020204en_AU
local.identifier.ariespublicationMigratedxPub16203en_AU
local.identifier.citationvolume82en_AU
local.identifier.doi10.1063/1.1557319en_AU
local.identifier.scopusID2-s2.0-0037416540
local.publisher.urlhttps://www.aip.org/en_AU
local.type.statusPublished Versionen_AU

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