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Anomalous Diffusion Mediated by Atom Deposition into a Porous Substrate

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Date

2009

Authors

Brault, Pascal
Josserand, Christophe
Bauchire, Jean-Marc
Caillard, A.
Charles, Christine
Boswell, Roderick

Journal Title

Journal ISSN

Volume Title

Publisher

American Physical Society

Abstract

Constant flux atom deposition into a porous medium is shown to generate a dense overlayer and a diffusion profile. Scaling analysis shows that the overlayer acts as a dynamic control for atomic diffusion in the porous substrate. This is modeled by generalizing the porous diffusion equation with a time-dependent diffusion coefficient equivalent to a nonlinear rescaling of time.

Description

Keywords

Keywords: Atomic physics; Atoms; Nonlinear equations; Porous materials; Anomalous diffusions; Atom depositions; Atomic diffusions; Diffusion equations; Diffusion profiles; Dynamic controls; Porous mediums; Porous substrates; Rescaling; Scaling analysis; Time-depend

Citation

URI

http://hdl.handle.net/1885/17356

Collections

ANU Research Publications

Source

Physical Review Letters

Type

Journal article

Book Title

Entity type

Access Statement

License Rights

DOI

10.1103/PhysRevLett.102.045901

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