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Refractive indices and thickness of optical waveguides fabricated by Si ion implantation into silica glass

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Date

1999

Authors

Gerondakis, Steve
Kubica, J
Zamora, M
Reeves, G K
Ridgway, Mark C
Johnson, Christopher

Journal Title

Journal ISSN

Volume Title

Publisher

Elsevier

Abstract

Planar optical waveguides formed by Si ion implantation into PECVD SiO2 have been characterized by the dark mode spectroscopy method at a wavelength of 0.6328 μm. The measured effective index values of the guided modes have been used to investigate the o

Description

Keywords

Keywords: Annealing; Glass; Ion implantation; Plasma enhanced chemical vapor deposition; Refractive index; Silica; Dark mode spectroscopy method; Silicon oxide; Optical waveguides

Citation

URI

http://hdl.handle.net/1885/93672

Collections

ANU Research Publications

Source

Thin Solid Films

Type

Journal article

Book Title

Entity type

Access Statement

License Rights

DOI

10.1016/S0040-6090(98)01333-9

Restricted until

2037-12-31

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Description
01_Gerondakis_Refractive_indices_and_1999.pdf (371.02 KB)

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