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Hydrogen Platelet Evolution in Mechanically Strained Silicon

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Date

2010

Authors

Pyke, Daniel
Elliman, Robert
McCallum, Jeffrey C.

Journal Title

Journal ISSN

Volume Title

Publisher

Institute of Electrical and Electronics Engineers (IEEE Inc)

Abstract

The effect of intrinsic and applied stress on hydrogen diffusion and trapping are studied by elastic-recoil detection (ERD), Rutherford backscattering and channelling (RBS-C) and transmission electron microscopy (TEM).

Description

Keywords

Keywords: Applied stress; Hydrogen diffusion; Rutherford back-scattering; Strained Silicon; TEM; Hydrogen; Rutherford backscattering spectroscopy; Transmission electron microscopy; Microelectronics

Citation

URI

http://hdl.handle.net/1885/51697

Collections

ANU Research Publications

Source

2010 conference on Optoelectronic and Microelectronic Materials and Devices Proceedings

Type

Conference paper

Book Title

Entity type

Access Statement

License Rights

DOI

10.1109/COMMAD.2010.5699728

Restricted until

2037-12-31

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Description
01_Pyke_Hydrogen_Platelet_Evolution_in_2010.pdf (546.34 KB)

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